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(a) Low magnification TEM image in the cross section view for the Fe-doped film deposited with the oxygen pressure of . (b) Enlarged high resolution TEM image of an example area at the interface between the substrate and the film. (c) The EDS line-scan profiles of In, O, and Fe along the growth direction.
(a) Bright field image of the cross section in the STEM mode for the same sample, as shown in (b)–(d) are the elemental mappings for In, O, and Fe, respectively.
XPS pattern of the film deposited with the oxygen pressure of .
(a) Hysteresis loops measured by alternating gradient magnetometer at room temperature with the applied magnetic field parallel and perpendicular to the film plane, respectively, for the sample deposited without introduced oxygen. (b) curve measured by superconducting quantum interference device below and by VSM above with the field of in the film plane.
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