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Conformal dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics
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10.1063/1.2928228
/content/aip/journal/apl/92/20/10.1063/1.2928228
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/20/10.1063/1.2928228
/content/aip/journal/apl/92/20/10.1063/1.2928228
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/content/aip/journal/apl/92/20/10.1063/1.2928228
2008-05-20
2015-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/20/10.1063/1.2928228
10.1063/1.2928228
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