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Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions
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10.1063/1.2936307
/content/aip/journal/apl/92/20/10.1063/1.2936307
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/20/10.1063/1.2936307

Figures

Image of FIG. 1.
FIG. 1.

Measured yield of secondary electrons vs kinetic energy of gold ions impacting polycrystalline gold, with the gold ion charge state as a parameter (data from Ref. 9, the lines are polynomial fit curves).

Image of FIG. 2.
FIG. 2.

Sputtering yield as a function of target (sheath) voltage and kind (including charge state) of impacting ions; SRIM calculations.

Tables

Generic image for table
Table I.

Workfunction and first and second ionization energies for selected materials.

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/content/aip/journal/apl/92/20/10.1063/1.2936307
2008-05-22
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/20/10.1063/1.2936307
10.1063/1.2936307
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