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Contact photolithographic micropatterning for bistable nematic liquid crystal displays
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View: Figures


Image of FIG. 1.
FIG. 1.

(a) Alignment pattern for a bistable surface on which neighboring squares are orthogonally aligned. Arrows indicate macroscopic bistable directions. (b) Pattern of checker photomask used to fabricate (a). (c) Schematic diagram of the bistable cell structure. The bottom substrate is micropatterned and the top substrate is uniformly aligned. The bistable states are HP (left) and TP (right). Pairs of electrodes used for switching are highlighted on the bottom.

Image of FIG. 2.
FIG. 2.

Simulated time-averaged spatial intensity profiles of the electric fields transmitted through a checker photomask (a) consisting of squares of at gap distances of (b) , (c) , (d) , (e) and (f) . The incident light with is polarized along the axis and travels along the axis. The degree of depolarization of the transmitted light is . White lines indicate checker boundaries.

Image of FIG. 3.
FIG. 3.

Images of a bistable LC cell observed between (a) crossed and (b) parallel polarizers. The arrows of P and A indicate polarizer and analyzer directions, respectively. The patterned area of (the inmost squares) is mainly in the HP state with spots in the TP state. [(c)–(e)] Optical micrographs of HP state with different polarizer orientations.

Image of FIG. 4.
FIG. 4.

Polarized optical micrographs of switching of a bistable cell. (a) HP, (b) , (c) TP and (d) . The switching field was for and for , respectively.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Contact photolithographic micropatterning for bistable nematic liquid crystal displays