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Simple fabrication technique of distributed-feedback polymer laser by direct photonanoimprint lithography
1.For example, D. Schneider, U. Lemmer, W. Kowalsky, and T. Riedl, in Organic Light Emitting Devices, edited by K. Müllen and U. Scherf (Wiley-VCH, Weinheim, 2006), pp. 369–395, and references therein.
2.For example, R. G. Hunsperger, in Integrated Optics (Springer, Berlin, 2002), p. 263.
9.V. Reboud, P. Lovera, N. Kehagias, M. Zelsmann, C. Schuster, F. Reuther, G. Gruetzner, G. Redmond, and C. M. Sotomayor Torres, Appl. Phys. Lett. 91, 151101 (2007).
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This paper describes a fabrication technique of polymeric distributed-feedback lasers using the photonanoimprint lithography. In devices with a grating structure, which was imprinted directly onto the active layer surface in vacuum, single-mode laser oscillations were easily obtained. The emission color of the distributed-feedback laser can be controlled only by changing dopingmaterial and grating period of the master mold. It was demonstrated that the nanoimprint lithography would be a key technology for development of a multicolor light source.
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