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Controlled in situ boron doping of short silicon nanowires grown by molecular beam epitaxy
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10.1063/1.2953702
/content/aip/journal/apl/92/26/10.1063/1.2953702
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/26/10.1063/1.2953702
/content/aip/journal/apl/92/26/10.1063/1.2953702
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/content/aip/journal/apl/92/26/10.1063/1.2953702
2008-07-02
2014-09-17
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Scitation: Controlled in situ boron doping of short silicon nanowires grown by molecular beam epitaxy
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/26/10.1063/1.2953702
10.1063/1.2953702
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