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The influence of a Cu buffer layer on the self-assembly of iron silicide nanostructures on Si(111)
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10.1063/1.2838737
/content/aip/journal/apl/92/4/10.1063/1.2838737
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/4/10.1063/1.2838737
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

STM micrographs of the surface morphology of Fe deposited on a Si(111) surface: partially covered with Cu at (a) , the arrows indicate the depressions with the reconstruction at the bottom (inset); fully covered surfaces at (b) , (c) , and (d) , the arrows indicate the crenate surface steps arising after Si consumption by the nanostructures.

Image of FIG. 2.
FIG. 2.

(a) Island density as a function of Fe deposition temperature (the solid line represents an exponential fit). (b) Island size distributions after deposition of Fe at 300, 475, and on fully covered surfaces.

Image of FIG. 3.
FIG. 3.

(a) STM image of the reconstruction observed on top of the self-assembled nanodots. (b) Island height distribution after deposition at . (c) CEMS spectra for islands grown at 300 and . (d) The ratio in the nanodots as a function of temperature.

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/content/aip/journal/apl/92/4/10.1063/1.2838737
2008-01-30
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The influence of a Cu buffer layer on the self-assembly of iron silicide nanostructures on Si(111)
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/4/10.1063/1.2838737
10.1063/1.2838737
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