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Energy-band alignment of gate dielectric stack
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10.1063/1.2839314
/content/aip/journal/apl/92/4/10.1063/1.2839314
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/4/10.1063/1.2839314
/content/aip/journal/apl/92/4/10.1063/1.2839314
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/content/aip/journal/apl/92/4/10.1063/1.2839314
2008-01-30
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Energy-band alignment of HfO2∕SiO2∕SiC gate dielectric stack
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/4/10.1063/1.2839314
10.1063/1.2839314
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