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The annealing temperature dependence of FTIR spectra for pure and films. (a) Pure films and (b) films.
Annealing-temperature dependence of XPS spectra for as-deposited film and the films annealed at 300, 500, and . (a) Y (b) O , and (c) N . N1 corresponds to bond and N2 corresponds to bonds.
Tauc plots for determining the optical band gap for films annealed at temperature 300, 600, and , respectively.
Valence-band photoelectron spectra of films annealed at different temperatures. (a) annealed, (b) annealed, (c) annealed, and (d) clean Si (100) substrate.
Schematic illustration of the effect of nitrogen (reduced with the increasing temperature) on energy gap and band offsets.
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