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Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing
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10.1063/1.2840997
/content/aip/journal/apl/92/5/10.1063/1.2840997
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/5/10.1063/1.2840997
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of the internal linear-type inductively coupled plasma source with a substrate size of .

Image of FIG. 2.
FIG. 2.

Ar plasma density measured using a Langmuir probe at the center of the chamber and rf rms current measured on the antenna of the double comb-type ICP using an impedance analyzer as a function of the rf power from at a pressure of Ar.

Image of FIG. 3.
FIG. 3.

(a) Ion saturation currents measured by a movable Langmuir probe system along the centerline of the chamber in a direction perpendicular to the antenna as a function of rf power at Ar. (b) Plasma uniformity over a substrate area of by scanning the movable Langmuir probe system above the substrate as a function of rf power at Ar.

Image of FIG. 4.
FIG. 4.

Etch uniformity of the photoresist film over a substrate area of measured at 8 kW rf power in an (7:3) mixture.

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/content/aip/journal/apl/92/5/10.1063/1.2840997
2008-02-08
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/5/10.1063/1.2840997
10.1063/1.2840997
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