Full text loading...
Schematic diagram of the internal linear-type inductively coupled plasma source with a substrate size of .
Ar plasma density measured using a Langmuir probe at the center of the chamber and rf rms current measured on the antenna of the double comb-type ICP using an impedance analyzer as a function of the rf power from at a pressure of Ar.
(a) Ion saturation currents measured by a movable Langmuir probe system along the centerline of the chamber in a direction perpendicular to the antenna as a function of rf power at Ar. (b) Plasma uniformity over a substrate area of by scanning the movable Langmuir probe system above the substrate as a function of rf power at Ar.
Etch uniformity of the photoresist film over a substrate area of measured at 8 kW rf power in an (7:3) mixture.
Article metrics loading...