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(Left) Center wavelength of the reflection band as a function of CLC polymer concentration. The data (▴) were measured from blends of known composition. (Right) The reflectance spectra of a film, uncured and cured. The film was prepared from a blend with a polymer concentration of .
The SEM micrograph of cross section of a broadband CLC film. The bottom substrate was closest to the UV light source during photopolymerization.
The broadening of the reflection band. (a) Before photopolymerization started, the film had a uniform pitch distribution. (b) Upon photopolymerization, pitches in the region closest to the UV light source were dilated and pitches in the region farther away were contracted. (c) As polymerization continued, the dilated pitches were further dilated and the contracted pitches were further contracted, resulting in a steeper gradient in pitch distribution.
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