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The effect of Ti doping on the growth of Mg nanostructures by oblique angle codeposition
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View: Figures


Image of FIG. 1.
FIG. 1.

SEM top view (left panel) and cross-sectional view (right panel) images of (a) Mg nanoblades and (b) Ti doped Mg nanorods. The incident vapor flux direction and the x-ray incident configurations for XRD measurement are illustrated with respect to the nanostructure morphology. The x-ray incident angle denotes that the x-ray is parallel to the substrate but pointing to the evaporation sources, while is the opposite direction.

Image of FIG. 2.
FIG. 2.

The typical XRD patterns measured at (a) with preferred Mg (101) orientation for Mg nanoblades; (b) at with preferred Mg (002) orientation for Ti doped Mg nanorods; (c) and (d) show the strongest diffraction peaks, Mg (101) and Mg (002), of Mg nanostructures with different Ti doping concentrations. The and values as a function of Ti concentration are shown in the corresponding insets and both indicate linear dependences. The slope of the linear vs Ti concentration curve is Ti for Mg (101) peak and Ti for Mg (002) peak, respectively.

Image of FIG. 3.
FIG. 3.

(a) A representative TEM image and (b) SAED pattern obtained from a single Ti doped Mg nanorod. The SAED reveals a hexagonal single crystal structure.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The effect of Ti doping on the growth of Mg nanostructures by oblique angle codeposition