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Plasma power measurement and hysteresis in the transition of a rf inductively coupled plasma system
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10.1063/1.2844885
/content/aip/journal/apl/92/6/10.1063/1.2844885
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/6/10.1063/1.2844885
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of the matching circuit.

Image of FIG. 2.
FIG. 2.

The dependence of the light emission at at different gas pressures on applied power (forward power minus reflected power).

Image of FIG. 3.
FIG. 3.

The dependence of the ion density, plasma emission intensity at , and relative metastable density on (a) applied power and (b) plasma power at . The hysteresis and inaccessible regions are indicated in (a) and (b), respectively. Note that the ion density and emission intensity are shown on a log scale while the metastable density is shown on a linear scale.

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/content/aip/journal/apl/92/6/10.1063/1.2844885
2008-02-13
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Plasma power measurement and hysteresis in the E–H transition of a rf inductively coupled plasma system
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/6/10.1063/1.2844885
10.1063/1.2844885
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