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Surface passivation and heterojunction cells on Si (100) and (111) wafers using dc and rf plasma deposited Si:H thin films
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10.1063/1.2857465
/content/aip/journal/apl/92/6/10.1063/1.2857465
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/6/10.1063/1.2857465
/content/aip/journal/apl/92/6/10.1063/1.2857465
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/content/aip/journal/apl/92/6/10.1063/1.2857465
2008-02-13
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface passivation and heterojunction cells on Si (100) and (111) wafers using dc and rf plasma deposited Si:H thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/6/10.1063/1.2857465
10.1063/1.2857465
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