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Deposition of carbon-free silicon dioxide from pure hexamethyldisiloxane using an atmospheric microplasma jet
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10.1063/1.2844880
/content/aip/journal/apl/92/9/10.1063/1.2844880
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/9/10.1063/1.2844880
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic experimental setup.

Image of FIG. 2.
FIG. 2.

FTIR spectra of deposited films for different HMDSO flow rates (from ) in the absence of in the plasma.

Image of FIG. 3.
FIG. 3.

Evolution of SiOSi asymmetric stretching AS1 peak position (◼) and FWHM (○) with respect to HMDSO flow rate.

Image of FIG. 4.
FIG. 4.

Evolution of the oxygen on silicon ratio and the carbon percentage of deposited materials in pure HMDSO with respect to HMDSO flow rate. The lines are guides to the eye.

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/content/aip/journal/apl/92/9/10.1063/1.2844880
2008-03-05
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Deposition of carbon-free silicon dioxide from pure hexamethyldisiloxane using an atmospheric microplasma jet
http://aip.metastore.ingenta.com/content/aip/journal/apl/92/9/10.1063/1.2844880
10.1063/1.2844880
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