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Oxygen defect induced photoluminescence of thin films
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10.1063/1.2952288
/content/aip/journal/apl/93/1/10.1063/1.2952288
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/1/10.1063/1.2952288
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Figures

Image of FIG. 1.
FIG. 1.

(a) Typical XRD pattern and (b) room-temperature PL spectrum of as-deposited thin films.

Image of FIG. 2.
FIG. 2.

(a) XRD patterns and (b) refractive index of the as-deposited film after annealing at various temperatures in flowing argon.

Image of FIG. 3.
FIG. 3.

(a) Room-temperature PL spectra; (b) the position and (c) the intensity of the PL peaks of films annealed in flowing argon; (d) the PL intensity of films annealed at as a function of the excitation laser power.

Image of FIG. 4.
FIG. 4.

(a) XRD patterns of films annealed in argon at and that further annealed in oxygen at ; (b) PL spectrum of films annealed in argon at ; (c) PL spectra of films annealed first in argon and then in oxygen at (black curve) and the as-deposited films (red curve), respectively.

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/content/aip/journal/apl/93/1/10.1063/1.2952288
2008-07-09
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Oxygen defect induced photoluminescence of HfO2 thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/1/10.1063/1.2952288
10.1063/1.2952288
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