1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Role of initial surface roughness on ion induced surface morphology
Rent:
Rent this article for
USD
10.1063/1.2974086
/content/aip/journal/apl/93/10/10.1063/1.2974086
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/10/10.1063/1.2974086
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a1) Flat Si (100) with a rms roughness of . Chemically generated different initial rough Si surfaces of rms roughness: (b1) , (c1) , (d1) , (e1) , and (f1) . (a2), (b2), (c2), (d2), (e2), and (f2) represent the corresponding AFM topographies after bombardment at a fluence of (a1), (b1), (c1), (d1), (e1), and (f1), respectively; the surface profile corresponding to the marked line for each AFM images is shown in the lower panel and the arrows indicate the beam direction. (g) Ion induced roughness , ripple wavelength, and correlation length as a function of initial surface roughness .

Image of FIG. 2.
FIG. 2.

AFM topographies of ion bombarded Si with an initial roughness of at fluences of (a) , (b) , (c) , (d) , (e) , (f) , and (g) . Morphology of the flat Si (100) surface after bombardment at (a1) (appearance of ripples) and (f1) (beginning of kinetic roughening); the surface profile corresponding to the marked line for each AFM image is shown in the lower panel and the arrows indicate the beam direction. (h) Ripple wavelength vs ion fluence for flat and different initially rough Si surfaces.

Loading

Article metrics loading...

/content/aip/journal/apl/93/10/10.1063/1.2974086
2008-09-08
2014-04-24
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Role of initial surface roughness on ion induced surface morphology
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/10/10.1063/1.2974086
10.1063/1.2974086
SEARCH_EXPAND_ITEM