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In situ tuning of omnidirectional microelectromechanical-systems microphones to improve performance fit in hearing aids
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10.1063/1.2989132
/content/aip/journal/apl/93/12/10.1063/1.2989132
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/12/10.1063/1.2989132
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic of a capacitive microphone integrated with a AgGeSe thin film to grow nanostructures on it and (b) 3D view of grown silver nanostructures on a parylene diaphragm, pictured by a Veeco NT9800 optical profilometer.

Image of FIG. 2.
FIG. 2.

(a) The fabricated dual microphone integrated with a AgGeSe thin film, (b) grown silver nanostructures, and (c) backside view of a microphone.

Image of FIG. 3.
FIG. 3.

(a) circuit schematic having a 0.1–200 kHz passband and (b) the microphone sensitivity over an audio frequency range measured in an EMI-shielded test fixture.

Image of FIG. 4.
FIG. 4.

(a) Acoustic responses upon nanostructure growth and (b) corresponding analysis on sensitivity mismatch and DI, showing the reduction in mismatch and the increase in DI from ① (2.76, 3.5) to ② (1. 6, 4.6) at 3 kHz where (, ) (A dotted line is projected, and all units are in dB).

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/content/aip/journal/apl/93/12/10.1063/1.2989132
2008-09-22
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ tuning of omnidirectional microelectromechanical-systems microphones to improve performance fit in hearing aids
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/12/10.1063/1.2989132
10.1063/1.2989132
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