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Spontaneous alignment of self-assembled triblock terpolymers for large-area nanolithography
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10.1063/1.2975370
/content/aip/journal/apl/93/13/10.1063/1.2975370
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/13/10.1063/1.2975370
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Figures

Image of FIG. 1.
FIG. 1.

AFM images of PS-PLA diblock thin films of thickness (a) 30 nm, (b) 70 nm, and (c) 150 nm. AFM images of PS-PI-PLA triblock thin films of thickness 30, 70, and 150 nm as spun [(d)–(f)] and after aqueous degradation [(g)–(i)].

Image of FIG. 2.
FIG. 2.

(a) Schematic of the initial structure. A 50 nm thick PS-PI-PLA film is deposited on a NiFe/Au coated substrate. The PS-PI-PLA film consists of PLA cylinders (maroon) coated by a PI sheath (yellow) in a PS matrix (gold). (b)–(d) show tapping mode AFM topographic images after (b) spin casting, (c) aqueous degradation and oxygen plasma etching, and (d) Ar ion beam milling for 3.5 min.

Image of FIG. 3.
FIG. 3.

Ar ion milling time dependence of (top panel) and normalized (bottom panel) using conventional thermal annealing of PS-PI-PLA triblocks [from Ref. 19], and spontaneous alignment of the triblock with no thermal anneal.

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/content/aip/journal/apl/93/13/10.1063/1.2975370
2008-10-02
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Spontaneous alignment of self-assembled ABC triblock terpolymers for large-area nanolithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/13/10.1063/1.2975370
10.1063/1.2975370
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