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XRD patterns of the 200-nm-thick (a) and (b) films fabricated at the same conditions as those in the heterostructure. The corresponding XPS spectra are shown in Figs. 1(c) and 1(d).
(a) curves of the structures. The top-left inset shows the curves. The bottom-left insets are the electrode settings and the bottom-right inset is the voltage shift , defined as . (b) Temperature dependence of the junction resistance . The inset is the curves.
(a) curves of the structures measured at different temperatures. The insets are the curves measured at 0 and 90 kOe at 30 and 200 K, respectively. (b) curves of the heterostructure measured at different currents.
Schematic density of states of the structures, (a) the case when the electrons diffuse into near the barrier, and negative MR appears, (b) the case when the electrons flow away from near the barrier, and positive MR appears.
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