1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching
Rent:
Rent this article for
USD
10.1063/1.2994691
/content/aip/journal/apl/93/13/10.1063/1.2994691
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/13/10.1063/1.2994691
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

SEM image of a ridge waveguide ( wide and high) (a), panchromatic CL image showing dark contrast at the ridge (b), and CL spectrum showing the band to band transition emission (c).

Image of FIG. 2.
FIG. 2.

Peak wavelength across nonetched ridge structures capped with (a) and (b) dielectric mask stripes of different widths. Solid: , squares: , circles: , and triangles: .

Image of FIG. 3.
FIG. 3.

Peak wavelength across ridges etched with a mask, showing the effect of the ridge height, solid: 300 nm, dashed: , and triangles: for ridges wide (a), and ridge width, solid: , squares: , circles: , and triangles: for ridges high (b). The measurements were performed after mask removing.

Loading

Article metrics loading...

/content/aip/journal/apl/93/13/10.1063/1.2994691
2008-10-02
2014-04-17
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/13/10.1063/1.2994691
10.1063/1.2994691
SEARCH_EXPAND_ITEM