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Direct measurements of the energy flux due to chemical reactions at the surface of a silicon sample interacting with a plasma
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10.1063/1.2995988
/content/aip/journal/apl/93/13/10.1063/1.2995988
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/13/10.1063/1.2995988
/content/aip/journal/apl/93/13/10.1063/1.2995988
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/content/aip/journal/apl/93/13/10.1063/1.2995988
2008-10-02
2014-07-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Direct measurements of the energy flux due to chemical reactions at the surface of a silicon sample interacting with a SF6 plasma
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/13/10.1063/1.2995988
10.1063/1.2995988
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