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Schematic diagram of bottom gate AZTO TFT structure.
XRD spectra of (a) AZTO thin film deposited at room temperature and (b) annealed at .
Transfer characteristics of AZTO TFT with the active layer deposited at room temperature ( characteristics of ZTO TFT are shown in the small box).
Transfer characteristics of AZTO TFT without heat treatment, annealed at , and in vacuum for 1 h.
Transfer characteristics of nonpassivated AZTO TFT annealed at in vacuum for 1 h and polyimide passivated AZTO TFT.
The field effect mobility change with (a) content in AZTO active layer and (b) ratio of the sputtering chamber.
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