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The peak widths at the half intensity calculated from the (a) XRD and (b) TEM results, utilizing the peak fitting with the amplitude version of Gaussian peak function. The variation of hardness with the microstructural change is shown in (c).
TEM bright field micrographs of (a) the as-sputtered thin film, specimen A, (b) the film after annealing at , specimen B, and (c) the film after annealing at , specimen C. The spotty contrast is a result of ion milling, it is not from the crystalline phase.
Relation between the strain rate and load versus indentation displacement for (a) specimen A and (b) specimen B. The curves for specimen C are similar to specimen B.
The high-resolution TEM image of (a) specimen A, (b) specimen B, and (c) specimen C. The marked circles correspond to the MRO clusters. (d), (e), and (f) show the Fourier transformed diffraction patterns for the white squares in (a), (b) and (c), respectively.
The nanoindentation properties of specimens A, B, and C, tested at . The data obtained from the binary Zr–Cu thin films in our laboratory are also included.
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