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Silicon out-diffusion and aluminum in-diffusion in devices with atomic-layer deposited thin films
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10.1063/1.3025850
/content/aip/journal/apl/93/19/10.1063/1.3025850
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/19/10.1063/1.3025850
/content/aip/journal/apl/93/19/10.1063/1.3025850
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/content/aip/journal/apl/93/19/10.1063/1.3025850
2008-11-12
2014-11-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Silicon out-diffusion and aluminum in-diffusion in devices with atomic-layer deposited La2O3 thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/19/10.1063/1.3025850
10.1063/1.3025850
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