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Modulated precursor flow epitaxial growth of AlN layers on native AlN substrates by metal-organic chemical vapor deposition
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10.1063/1.2959064
/content/aip/journal/apl/93/2/10.1063/1.2959064
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/2/10.1063/1.2959064
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Microscopic surface morphology of an AlN layer (as measured by AFM) grown by conventional epitaxial growth on a bulk AlN substrate grown at with (a) and (b) scan areas.

Image of FIG. 2.
FIG. 2.

Microscopic surface morphology of AlN layers (as measured by AFM with scan area) grown on AlN/sapphire templates grown at (a) , (b) , and (c) .

Image of FIG. 3.
FIG. 3.

Microscopic surface morphology of an AlN layer grown by modulated precursor epitaxy growth at with (a) and (b) scan areas.

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/content/aip/journal/apl/93/2/10.1063/1.2959064
2008-07-15
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Modulated precursor flow epitaxial growth of AlN layers on native AlN substrates by metal-organic chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/2/10.1063/1.2959064
10.1063/1.2959064
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