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[(a)–(d)] Process flow for ion implantation induced transfer layer to . (e) Cross-sectional FE-SEM image of the transferred InAs layer to .
AFM topograph images of InAs on (a) directly after ion-cut induced transfer and (b) after wet etching of damaged layer and OMVPE thin film growth. (c) cross-sectional FE-SEM at the base of an InAs NW grown on . Inset is FE-SEM image of InAs NWs grown on .
(a) FE-SEM image of ordered InAs NW arrays grown on . (b) angle-view FE-SEM images of vertical and electrically isolated InAs NWs on . (c) Zoom-in FE-SEM image of an InAs NW with an InAs island at its base, sitting on substrate and electrically isolated from other NWs for individual NW addressing.
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