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Multiple pulse thermal damage thresholds of materials for x-ray free electron laser optics investigated with an ultraviolet laser
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/content/aip/journal/apl/93/20/10.1063/1.3021081
2008-11-19
2014-10-25

Abstract

Optical elements to be used for x-ray free electron lasers (XFELs) must withstand multiple high-fluence pulses. We have used an ultraviolet laser to study the damage of two candidate materials, crystalline Si and -coated Si, emulating the temperature profile expected to occur in optics exposed to XFEL pulses. We found that the damage threshold for pulses is to 70% lower than the melting threshold.

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Scitation: Multiple pulse thermal damage thresholds of materials for x-ray free electron laser optics investigated with an ultraviolet laser
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/20/10.1063/1.3021081
10.1063/1.3021081
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