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Optical elements to be used for x-ray free electron lasers (XFELs) must withstand multiple high-fluence pulses. We have used an ultraviolet laser to study the damage of two candidate materials, crystalline Si and -coated Si, emulating the temperature profile expected to occur in optics exposed to XFEL pulses. We found that the damage threshold for pulses is to 70% lower than the melting threshold.


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