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SEM images of discontinuous Au films on SiN with thicknesses, , of (a) 2 nm, (b) 4 nm, (c) 6 nm, and (d) 10 nm. The same scale bar applies to all of (a)–(d).
Measured resistance vs during deposition (full line) and resistance calculated using Eq. (1) (circles). The data for are noisy because the leakage resistance makes the accurate measurement difficult.
Resistance vs time during the deposition of 3.6 nm diameter Pd clusters on a sensor with . The arrow indicates the end of the deposition. Short dashes: results of resistance model using ; long dashes: results of resistance model using .
Mean Au island diameter, (diamonds, left scale), fitted with Eq. (4) (solid line), and coverage (circles, right scale), fitted with Eq. (5) (dashed line) vs . Measurement uncertainties are smaller than the data points except where shown.
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