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Optical nanolithography using a scanning near-field probe with an integrated light source
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10.1063/1.3032912
/content/aip/journal/apl/93/21/10.1063/1.3032912
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/21/10.1063/1.3032912
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Layout of the integrated SNOM probe. (a) Schematic showing the three substrates: LED (top), microlens with spatial filter (middle), and SNOM cantilever (bottom). (b) A SEM image of the cantilever above the microlens and deflection laser window with the inset showing the SNOM aperture.

Image of FIG. 2.
FIG. 2.

LED structure and performance. (a) Schematic of the LED layout. (b) Input current and output power as a function of applied bias with (inset) the electroluminescence spectra. (c) Optical micrograph of a LED array showing the optical window for the deflection laser.

Image of FIG. 3.
FIG. 3.

Photoresist exposed by the integrated SNOM probe. (a) An AFM image of an array of dots with 200 nm period. (b) A cross section of the cut shown in (a).

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/content/aip/journal/apl/93/21/10.1063/1.3032912
2008-11-24
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Optical nanolithography using a scanning near-field probe with an integrated light source
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/21/10.1063/1.3032912
10.1063/1.3032912
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