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Calculated reflectivity spectra at normal incidence for surface textures composed of (a) paraboloidlike nipple lens, (b) pillar with a cone-shape etch top, and (c) pyramidal grating over Si. Inset: The corresponding etch shapes and calculated effective refractive index profiles. The textures are assumed to reside on a square lattice at a periodicity of with a filling factor of 75% and an aspect ratio of 0.6.
SEM micrographs of a PS paved Si surface illustrating recessive size reduction after 3 and of RIE treatment.
(a) Contour plots of an etched PS mask after 3, 5, 7, and of RIE treatment. Inset: Polar angle dependent etch rate with data taken at an interval between 3 and etch treatment. (b) AFM micrograph revealing a close-packed Si nipple array at a periodicity of . Inset: Backward diffraction patterns taken with a blue laser. (c) AFM micrograph showing a paraboloidlike surface structure in the Si nipple array.
-period paraboloidlike nipple lens array of (a) Si and (b) GaN showing aspect ratios of 0.59 and 0.94, respectively. (c) Experimental and RCWA-calculated reflectivity spectra for the -period Si nipple lens array in a near close-packed condition of filling factor of 85.6% and in a non-close-packed condition of filling factor of 42.6%.
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