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Photoinduced reduction and pattern preservation of giant surface potential on tris(8-hydroxyquinolinato) aluminum(III) thin films
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/content/aip/journal/apl/93/26/10.1063/1.3058439
2008-12-30
2014-10-22

Abstract

The characteristics and mechanisms of photoinduced reduction in giant surface potential (gSP) on tris(8-hydroxyquinolinato) aluminum(III) thin films were investigated and discussed from the results of the reduction dependences on exposure time/intensity and the preservation of photopatterned gSP. The reduction dependences are explained well with numerical-model calculation of surface potential reduction due to the drift of photoexcited carriers assuming the Poole–Frenkel formula for electron mobility. The preservation of patterned gSPs suggests the existence of deep traps involved in the carrier-drift mechanism.

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Scitation: Photoinduced reduction and pattern preservation of giant surface potential on tris(8-hydroxyquinolinato) aluminum(III) thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/26/10.1063/1.3058439
10.1063/1.3058439
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