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Modulating effects of the low-frequency source on ion energy distributions in a dual frequency capacitively coupled plasma
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10.1063/1.2945890
/content/aip/journal/apl/93/3/10.1063/1.2945890
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/3/10.1063/1.2945890
/content/aip/journal/apl/93/3/10.1063/1.2945890
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/content/aip/journal/apl/93/3/10.1063/1.2945890
2008-07-24
2014-07-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Modulating effects of the low-frequency source on ion energy distributions in a dual frequency capacitively coupled plasma
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/3/10.1063/1.2945890
10.1063/1.2945890
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