1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
In situ metal-organic chemical vapor deposition atomic-layer deposition of aluminum oxide on GaAs using trimethyaluminum and isopropanol precursors
Rent:
Rent this article for
USD
10.1063/1.2960574
/content/aip/journal/apl/93/3/10.1063/1.2960574
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/3/10.1063/1.2960574
/content/aip/journal/apl/93/3/10.1063/1.2960574
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/93/3/10.1063/1.2960574
2008-07-21
2014-09-19
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ metal-organic chemical vapor deposition atomic-layer deposition of aluminum oxide on GaAs using trimethyaluminum and isopropanol precursors
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/3/10.1063/1.2960574
10.1063/1.2960574
SEARCH_EXPAND_ITEM