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Multiple substrate microwave plasma-assisted chemical vapor deposition single crystal diamond synthesis
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10.1063/1.2961016
/content/aip/journal/apl/93/3/10.1063/1.2961016
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/3/10.1063/1.2961016
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Cross-sectional view of the microwave reactor scaled to operate at with up to substrates.

Image of FIG. 2.
FIG. 2.

Top view microscope photos of the 70 seed MPCVD deposition experiment on type Ib synthetic substrates. Each diamond surface is about .

Image of FIG. 3.
FIG. 3.

Growth rate results of the 70 seed MPCVD deposition experiment over a series of sequential depositions.

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/content/aip/journal/apl/93/3/10.1063/1.2961016
2008-07-23
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Multiple substrate microwave plasma-assisted chemical vapor deposition single crystal diamond synthesis
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/3/10.1063/1.2961016
10.1063/1.2961016
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