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Pre-atomic layer deposition surface cleaning and chemical passivation of (100) and deposition of ultrathin gate insulators
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10.1063/1.2966357
/content/aip/journal/apl/93/5/10.1063/1.2966357
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/5/10.1063/1.2966357
/content/aip/journal/apl/93/5/10.1063/1.2966357
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/content/aip/journal/apl/93/5/10.1063/1.2966357
2008-08-08
2014-12-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Pre-atomic layer deposition surface cleaning and chemical passivation of (100) In0.2Ga0.8As and deposition of ultrathin Al2O3 gate insulators
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/5/10.1063/1.2966357
10.1063/1.2966357
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