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(a) The dc sweep of different electrode is shown. The resistance window of electrode increases with increases of content. The Ru is metallic ruthenium electrode whereas is deposited in twice the amount of than . The inset shows the oxide metal electrode stack. (b) Pulse switching data at width are compared for different electrodes discussed in this work including Pt.
Pulse switching data of electrode at pulse width. The resistive window remains unchanged after of applied pulses.
XRD spectroscopy analysis of different electrodes deposited at room temperature. Three Ru peaks were observed for the electrodes as indicated in the figure but the intensity of Ru (100) and Ru (101) decreases for both and compared to Ru electrode. This indicates that amorphous phase is formed when is introduced.
(a) and (b) shows the HRTEM images of and Pt electrode on top of Nb:STO substrate, respectively. Two separate localized phases of crystalline and amorphous phases are present. Furthermore interface oxide layer was formed for , which disturbs the near interface crystalline orientation. For Pt, sharp interface with no change in STO crystal orientation is observed.
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