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Band alignment and thermal stability of gate dielectric on SiC
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10.1063/1.2969061
/content/aip/journal/apl/93/5/10.1063/1.2969061
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/5/10.1063/1.2969061
/content/aip/journal/apl/93/5/10.1063/1.2969061
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/content/aip/journal/apl/93/5/10.1063/1.2969061
2008-08-07
2014-09-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Band alignment and thermal stability of HfO2 gate dielectric on SiC
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/5/10.1063/1.2969061
10.1063/1.2969061
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