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High-density horizontally aligned growth of carbon nanotubes with Co nanoparticles deposited by arc-discharge plasma method
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10.1063/1.2969290
/content/aip/journal/apl/93/5/10.1063/1.2969290
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/5/10.1063/1.2969290
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic and (b) photograph of ADP gun used for deposition of Co nanoparticles.

Image of FIG. 2.
FIG. 2.

(a) AFM image and (b) height distribution of Co particles deposited by ADP. The line crossing on the lower left in (a) is the residual photoresist at the edge of photolithographic pattern. (c) and (d) are those of Co particles deposited by EB evaporation after annealed at .

Image of FIG. 3.
FIG. 3.

SEM images of SWNTs grown on quartz substrate.

Image of FIG. 4.
FIG. 4.

and as a function of at . The inset shows a schematic of fabricated multichannel CNFET with high- top-gate structure.

Image of FIG. 5.
FIG. 5.

(a) Bird’s eye-view illustration and energy-band diagram at source contact.

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/content/aip/journal/apl/93/5/10.1063/1.2969290
2008-08-07
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High-density horizontally aligned growth of carbon nanotubes with Co nanoparticles deposited by arc-discharge plasma method
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/5/10.1063/1.2969290
10.1063/1.2969290
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