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(a) Schematic and (b) photograph of ADP gun used for deposition of Co nanoparticles.
(a) AFM image and (b) height distribution of Co particles deposited by ADP. The line crossing on the lower left in (a) is the residual photoresist at the edge of photolithographic pattern. (c) and (d) are those of Co particles deposited by EB evaporation after annealed at .
SEM images of SWNTs grown on quartz substrate.
and as a function of at . The inset shows a schematic of fabricated multichannel CNFET with high- top-gate structure.
(a) Bird’s eye-view illustration and energy-band diagram at source contact.
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