Full text loading...
Sketch of the setup to measure the Xe content in the target. In the cross-sectional drawing to the left, the configuration of the magnet assembly is indicated. The angle is defined as the angle between the incoming beam and the center of the left race track at a counterclockwise rotation.
The Xe content as a function of time after sputtering. The Ti target was sputtered in a mixture of Xe and , at a pressure of and a constant discharge current of . The rotation speed during sputtering was 1 turn/. After sputtering, the target was kept stationary.
The energy distribution of (a) and (b) as a function of the total pressure for a Ti sputtered in a mixture of Xe and . The total pressure was changed by varying the pumping speed. The position of the low-energy peak in (a) has been scaled to zero energy.
Article metrics loading...