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Atomic control and characterization of surface defect states of terminated single crystals
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View: Figures


Image of FIG. 1.
FIG. 1.

AFM images of characteristic terminated substrates. (a) A vicinal surface of the STO samples prepared by the HCLNO method. The average area roughness is . (b) The surface morphology of the reference STO crystals prepared by the conventional BHF method from Ref. 13–15. In both cases, the elevated 3D view highlights the resulting surface quality along the ledges.

Image of FIG. 2.
FIG. 2.

(a) PL spectra of the as-received, treated by HCLNO (SA) and BHF (RA) methods. As seen, upon treatment there is a dramatic change in both the PL intensity and the lineshape of the spectra. (b) The same crystals after reannealing in high-pressure resulting in the remarkable reduction of the PL intensity. For comparison also shown the PL spectrum of the Nb (0.5%) doped STO.

Image of FIG. 3.
FIG. 3.

Ti XAS spectra of the HCLNO treated and annealed samples taken in TEY and FY modes and compared to the reference and STO samples from Ref. 16.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic control and characterization of surface defect states of TiO2 terminated SrTiO3 single crystals