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Fabrication of three-dimensional photonic crystal structures by interferometric lithography and nanoparticle self-assembly
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10.1063/1.2971202
/content/aip/journal/apl/93/7/10.1063/1.2971202
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/7/10.1063/1.2971202
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

SEM images of two-layer void-channel structures with 1000 nm period and 50 nm diameter silica nanoparticles.

Image of FIG. 2.
FIG. 2.

SEM images of void channel structures with 1000 nm period and 50 nm silica nanoparticles. [(a) and (b)] three-layered structures . [(c) and (d)] four-layered structures .

Image of FIG. 3.
FIG. 3.

SEM images of four-layered void channel structures with 500 nm period and 50 nm silica nanoparticles from two different directions.

Image of FIG. 4.
FIG. 4.

The transmission spectra of the 3D crystals shown in Figs. 1 and 2 measured with FTIR from silica nanoparticle film, two-layer, three-layer, and four-layer PCs. The three main dips are from intrinsic absorption in the silica nanoparticles , stop band , and second-order Bragg diffraction .

Image of FIG. 5.
FIG. 5.

Experimental and RCWA-simulated transmission spectrum at normal incidence.

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/content/aip/journal/apl/93/7/10.1063/1.2971202
2008-08-20
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of three-dimensional photonic crystal structures by interferometric lithography and nanoparticle self-assembly
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/7/10.1063/1.2971202
10.1063/1.2971202
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