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Excitation of dielectric-loaded surface plasmon polariton observed by using near-field optical microscopy
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Image of FIG. 1.

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FIG. 1.

(a) SEM image of CdS nanostripes. (b) Higher resolution SEM image of the single CdS nanostripe. (c) Energy-dispersive x-ray spectrum of CdS. (d) SEM image of the Ag film surface with a roughness of 10 nm.

Image of FIG. 2.

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FIG. 2.

Schematic of the SNOM setup and the experimental process.

Image of FIG. 3.

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FIG. 3.

(a) Far-field PL image of CdS nanostripe excited by the 442 nm laser. (b) Near-field optical image of CdS nanostripe corresponding to the region of (a). The position of the laser focus is unchanged during the measurement. (c) Near-field PL spectra detected with the SNOM collection tip at positions A (rhombus), B (square), and C (triangle), respectively.

Image of FIG. 4.

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FIG. 4.

(a) Sketch of the simulated CdS nanostripe placed on a Ag layer. (b) Normalized intensity profile of the TE mode supported by the structure. (c) Mode profile at . (d) Sketch of the band structure of the nanostripe semiconductor surface. The band-to-band transition occurs at an energy that is lower than the energy gap (see Ref. 11).

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/content/aip/journal/apl/93/7/10.1063/1.2973355
2008-08-22
2014-04-21

Abstract

The excitation of dielectric-loaded surface plasmon polariton (DLSPP) by a CdS nanostripe placed on a Ag layer is observed by using a scanning near-field optical microscopy (SNOM). The spectroscopic redshift of 30 meV of photoluminescence is observed at different positions of the stripe by SNOM and can be explained as the result of Franz–Keldysh effect. Finite difference time domain calculations confirm the observations of the near-field optical images and spectroscopic data. This DLSPP excitation structure is important in the implementation of photonic integrated circuits as well as the optical guiding modes in plasmonic devices.

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Scitation: Excitation of dielectric-loaded surface plasmon polariton observed by using near-field optical microscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/7/10.1063/1.2973355
10.1063/1.2973355
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