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Partially coherent extreme ultraviolet interference lithography for patterning research
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10.1063/1.2973178
/content/aip/journal/apl/93/8/10.1063/1.2973178
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/8/10.1063/1.2973178
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Figures

Image of FIG. 1.
FIG. 1.

(a) Resolution SEMs from the SEMATECH 0.3 NA EUV MET using TOK-1088P photoresist and simulated aerial images with measured rms wavefront error and 7% flare. (b) line/space Bossung and MTF curves. (c) A Zernike fit of measured aberrations on the Albany EUV MET.

Image of FIG. 2.
FIG. 2.

(a) A cascaded-grating interferometer with first and second grating periods of 64 and , respectively, operated in first order and (b) with period gratings operated in first and second orders, respectively.

Image of FIG. 3.
FIG. 3.

(a) Partially coherent interference intensity through focus with a half-period of . (b) MTF of the interference fringes through focus for beam divergences from to .

Image of FIG. 4.
FIG. 4.

Rectangular grating layer thickness and linewidth optimization for (a) period first grating in the first order at normal incidence, (b) period second grating in the first order with illumination incident from the first grating, and (c) period second grating in the negative second order with illumination incident from first grating.

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/content/aip/journal/apl/93/8/10.1063/1.2973178
2008-08-26
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Partially coherent extreme ultraviolet interference lithography for 16nm patterning research
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/8/10.1063/1.2973178
10.1063/1.2973178
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