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Partially coherent extreme ultraviolet interference lithography for patterning research
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10.1063/1.2973178
/content/aip/journal/apl/93/8/10.1063/1.2973178
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/8/10.1063/1.2973178
/content/aip/journal/apl/93/8/10.1063/1.2973178
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/content/aip/journal/apl/93/8/10.1063/1.2973178
2008-08-26
2014-10-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Partially coherent extreme ultraviolet interference lithography for 16nm patterning research
http://aip.metastore.ingenta.com/content/aip/journal/apl/93/8/10.1063/1.2973178
10.1063/1.2973178
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