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Schematic diagram of the planar layer configuration.
Reflectance vs incident angle of dielectric layer coated with silver film.
Electric field distribution of the interference pattern generated by the field components (a) and (b) on the photoresist layer.
Normalized intensities of the electric field components as a function of the decay direction from the origin.
Intensity contrast as a function of decay length from the origin.
Normalized intensities of the electric field components as a function of dielectric and metal layer thickness at .
Resist profile cross section at exposure times, (a) and (b) .
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