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Absorption spectrum of a thin film of PU-AS-Y-DCV spin coated on a glass substrate. The vertical dashed lines point out the wavelengths employed in the experiment, 488 and 800 nm. The inset reports the molecular structure of PU-AS-Y-DCV.
(a) Topographic AFM image and (b) line profile of a topographical feature obtained in the one-photon process. (c) Topographic AFM image and (d) line profile of the feature obtained in the two-photon process.
AFM image of a area of a grating with 2 (a) and (b) periods, respectively. Inset: AFM image of a 500 nm period grating. Vertical scale: 15 nm. The gratings have been realized with a writing speed of .
Features height vs two-photon exposure time for different values of the laser power injected into the high NA microscope objective. The exposure peak intensities are 3.5 (full circles), 1.7 (empty squares), 0.9 (full squares), and (empty circles). The dashed line represents a fit of the experimental data based on a phenomenological model (see text) for an exposure peak intensity of . Fits of experimental data obtained with lower peak intensities provide similar accordance.
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