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On the anisotropic shear resistance of hard transition metal nitrides TMN
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10.1063/1.3105990
/content/aip/journal/apl/94/12/10.1063/1.3105990
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/12/10.1063/1.3105990
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Stress-strain relationships calculated by ab initio DFT for fcc(NaCl)–TiN, –ZrN, and –HfN.

Image of FIG. 2.
FIG. 2.

Valence charge density difference in (001) planes shown for TiN, ZrN, and HfN. The thick solid and thin dotted contours represent positive and negative value, respectively. The italic numbers give the VCDD in .

Image of FIG. 3.
FIG. 3.

(a) Calculated density of state and [(b)–(f)] the change of the valence charge density difference projected onto (001) plane during shearing along the slip system for fcc-TiN.

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/content/aip/journal/apl/94/12/10.1063/1.3105990
2009-03-23
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: On the anisotropic shear resistance of hard transition metal nitrides TMN (TM=Ti, Zr, Hf)
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/12/10.1063/1.3105990
10.1063/1.3105990
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