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Transmission electron microscopy study on the crystallization and boron distribution of CoFeB/MgO/CoFeB magnetic tunnel junctions with various capping layers
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10.1063/1.3106624
/content/aip/journal/apl/94/12/10.1063/1.3106624
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/12/10.1063/1.3106624
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Cross-sectional HRTEM images of MTJ with Ta cap (a) before annealing, (b) after annealing at for 4 h, and (c) after annealing at for 4 h. Solid lines indicate EELS intensity of B distribution.

Image of FIG. 2.
FIG. 2.

Cross-sectional HRTEM images of MTJ with NiFe cap (a) before annealing, (b) after annealing at for 4 h, and (c) after annealing at for 4 h. Solid lines indicate EELS intensity of B distribution.

Image of FIG. 3.
FIG. 3.

Cross-sectional HRTEM images of MTJ with Ti cap (a) before annealing, (b) after annealing at for 4 h, and (c) after annealing at for 4 h. Solid lines indicate EELS intensity of B distribution.

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/content/aip/journal/apl/94/12/10.1063/1.3106624
2009-03-23
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Transmission electron microscopy study on the crystallization and boron distribution of CoFeB/MgO/CoFeB magnetic tunnel junctions with various capping layers
http://aip.metastore.ingenta.com/content/aip/journal/apl/94/12/10.1063/1.3106624
10.1063/1.3106624
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