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Schematic illustrating film synthesis and patterning processes. The solution based mixture is created and applied to substrates using a spin-coating process, and a photoactive compound in the solution generates free-radicals in response to UV exposure. The monomeric precursors rapidly polymerize to create micropatterns for final inorganic-organic device structures.
Optical images of different sizes and shapes of lead-containing hybrid film structures. Both panels are achieved by simultaneous exposure using a single mask and exposure conditions. (a) Patterned features for uniformly distributed lines and spaces. (b) Patterned features for square boxes adjacent to different dimension line structures.
EDX spectrum of hybrid film. The film contains both inorganic and organic constituents, and the final composition can be tuned by adjusting the percentage of precursor materials during film synthesis.
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