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XRD patterns of as-deposited films on substrate at with different oxygen pressures. The x-ray wavelength is 0.17889 nm, corresponding to the Co radiation.
XPS spectra for thin films showing the (a) and (b) lines recorded using an incident monochromatic Al Kα radiation (1486.7 eV).
(a) Room temperature optical absorption spectrum of film deposited at of on substrate. The inset shows the vs the photon energy . (b) Variation of the optical band gap as a function of the oxygen pressure during the deposition of thin films on substrates.
Temperature dependence of the resistance for a 160 nm thick film grown under an oxygen pressure of .
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